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High-throughput three-dimensional lithographic microfabrication

Author(s)
Kim, Daekeun; So, Peter T. C.
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Abstract
A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist.
Date issued
2015-05
URI
http://hdl.handle.net/1721.1/120522
Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
Journal
Optics Letters
Publisher
The Optical Society
Citation
Kim, Daekeun, and Peter T. C. So. “High-Throughput Three-Dimensional Lithographic Microfabrication.” Optics Letters 35, no. 10 (May 6, 2010): 1602.
Version: Author's final manuscript
ISSN
0146-9592
1539-4794

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