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dc.contributor.authorZhang, Yuhao
dc.contributor.authorSun, Min
dc.contributor.authorPerozek, Joshua A.
dc.contributor.authorLiu, Zhihong
dc.contributor.authorZubair, Ahmad
dc.contributor.authorPiedra, Daniel
dc.contributor.authorChowdhury, Nadim
dc.contributor.authorGao, Xiang
dc.contributor.authorShepard, Kenneth
dc.contributor.authorPalacios, Tomas
dc.date.accessioned2019-07-10T17:16:31Z
dc.date.available2019-07-10T17:16:31Z
dc.date.issued2018-11
dc.identifier.issn0741-3106
dc.identifier.issn1558-0563
dc.identifier.urihttps://hdl.handle.net/1721.1/121563
dc.description.abstractThis letter presents the first experimental study on capacitances, charges, and power-switching figure of merits (FOM) for a large-area vertical GaN power transistor. A 1.2-kV, 5-A GaN vertical power FinFET was demonstrated in a chip area of 0.45 mm2, with a specific on-resistance of 2.1 mΩ·cm2 and a threshold voltage of 1.3 V. Device junction capacitances were characterized and their main components were identified. This was used to calculate the switching charges and practical switching frequencies. Device FOMs were then derived that take into account the trade-offs between the conduction and switching power losses. Our GaN vertical FinFETs exhibit high-frequency (MHz) switching capabilities and superior switching FOMs when compared with commercial 0.9-1.2-kV Si and SiC power transistors. This letter shows the great potential of GaN vertical FinFETs for next-generation medium-voltage power electronics.en_US
dc.language.isoen
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1109/led.2018.2880306en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceOther repositoryen_US
dc.titleLarge Area 1.2 kV GaN Vertical Power FinFETs with a Record Switching Figure-of-Meriten_US
dc.typeArticleen_US
dc.identifier.citationZhang, Yuhao et al. "Large Area 1.2 kV GaN Vertical Power FinFETs with a Record Switching Figure-of-Merit." IEEE Electron Device Letters 40, 1 (January 2019): 75 - 78 © 2018 IEEEen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.relation.journalIEEE Electron Device Lettersen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2019-07-01T13:30:51Z
dspace.date.submission2019-07-01T13:30:52Z
mit.journal.volume40en_US
mit.journal.issue1en_US


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