| dc.contributor.author | Charaev, Ilya | |
| dc.contributor.author | Dane, Andrew | |
| dc.contributor.author | Agarwal, Akshay | |
| dc.contributor.author | Berggren, Karl K. | |
| dc.date.accessioned | 2020-04-13T13:15:34Z | |
| dc.date.available | 2020-04-13T13:15:34Z | |
| dc.date.issued | 2019-02 | |
| dc.identifier.issn | 1051-8223 | |
| dc.identifier.issn | 1558-2515 | |
| dc.identifier.issn | 2378-7074 | |
| dc.identifier.uri | https://hdl.handle.net/1721.1/124559 | |
| dc.description.abstract | The method of negative-tone polymethyl methacrylate (PMMA) electron-beam lithography is investigated to improve the performance of nanowire-based superconducting detectors. Using this approach, the superconducting nanowire single-photon detectors (SNSPDs) have been fabricated from 5-nm-thick NbN film sputtered at room temperature. To investigate the impact of this process, SNSPDs were prepared by positive-tone- and negative-tone-PMMA lithography, and their electrical and photodetection characteristics at 4.2 K were compared. The SNSPDs made by negative-tone-PMMA lithography show higher critical-current density and higher photon count rate at various wavelengths. Our results suggest a higher negative-tone-PMMA technology may be preferable to the standard positive-tone-PMMA lithography for this application. Keywords: Films; Nanowires; Lithography; Temperature measurement; Detectors; Current measurement; Niobium compounds | en_US |
| dc.language.iso | en | |
| dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1109/tasc.2019.2898677 | en_US |
| dc.rights | Creative Commons Attribution-Noncommercial-Share Alike | en_US |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-sa/4.0/ | en_US |
| dc.source | arXiv | en_US |
| dc.title | Enhancement of Optical Response in Nanowires by Negative-Tone PMMA Lithography | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Charaev, Ilya et al "Enhancement of Optical Response in Nanowires by Negative-Tone PMMA Lithography." IEEE Transactions on Applied Superconductivity 29, 5 (August 2019): 1100905 ©2019 IEEE. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
| dc.relation.journal | IEEE Transactions on Applied Superconductivity | en_US |
| dc.eprint.version | Original manuscript | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/NonPeerReviewed | en_US |
| dc.date.updated | 2019-05-08T17:38:46Z | |
| dspace.date.submission | 2019-05-08T17:38:46Z | |
| mit.journal.volume | 29 | en_US |
| mit.journal.issue | 5 | en_US |
| mit.metadata.status | Complete | |
