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dc.contributor.authorPang, Edward L.
dc.contributor.authorLarsen, Peter Mahler
dc.contributor.authorSchuh, Christopher A
dc.date.accessioned2020-09-11T22:29:48Z
dc.date.available2020-09-11T22:29:48Z
dc.date.issued2019-10
dc.date.submitted2019-10
dc.identifier.issn1879-2723
dc.identifier.urihttps://hdl.handle.net/1721.1/127250
dc.description.abstractAccurate pattern center determination has long been a challenge for the electron backscatter diffraction (EBSD) community and is becoming critically accuracy-limiting for more recent advanced EBSD techniques. Here, we study the parameter landscape over which a pattern center must be fitted in quantitative detail and reveal that it is both “sloppy” and noisy, which limits the accuracy to which pattern centers can be determined. To locate the global optimum in this challenging landscape, we propose a combination of two approaches: the use of a global search algorithm and averaging the results from multiple patterns. We demonstrate the ability to accurately determine pattern centers of simulated patterns, inclusive of effects of binning and noise on the error of the fitted pattern center. We also demonstrate the ability of this method to accurately detect changes in pattern center in an experimental dataset with noisy and highly binned patterns. Source code for our pattern center fitting algorithm is available online. ©2019 Elsevier B.V.en_US
dc.description.sponsorshipNSF Graduate Research Fellowship Program (DGE-1745302)en_US
dc.description.sponsorshipDanish Council for Independent Research (7026-00126B)en_US
dc.language.isoen
dc.publisherElsevier BVen_US
dc.relation.isversionofhttps://dx.doi.org/10.1016/J.ULTRAMIC.2019.112876en_US
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivs Licenseen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/en_US
dc.sourcearXiven_US
dc.titleGlobal optimization for accurate determination of EBSD pattern centersen_US
dc.typeArticleen_US
dc.identifier.citationPang, Edward L. et al., "Global optimization for accurate determination of EBSD pattern centers." Ultramicroscopy 209 (February 2020): 112876 doi. 10.1016/j.ultramic.2019.112876 ©2019 Authorsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.relation.journalUltramicroscopyen_US
dc.eprint.versionOriginal manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2020-09-11T16:41:34Z
dspace.date.submission2020-09-11T16:41:36Z
mit.journal.volume209en_US
mit.licensePUBLISHER_CC
mit.metadata.statusComplete


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