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dc.contributor.authorLi, Nanxi
dc.contributor.authorMagden, Emir Salih
dc.contributor.authorSu, Zhan
dc.contributor.authorSingh, Neetesh
dc.contributor.authorRuocco, Alfonso
dc.contributor.authorXin, Ming
dc.contributor.authorByrd, Matthew James
dc.contributor.authorCallahan, Patrick T.
dc.contributor.authorBradley, Jonathan
dc.contributor.authorBaiocco, Christopher
dc.contributor.authorVermeulen, Diedrik Rene Georgette
dc.contributor.authorWatts, Michael
dc.date.accessioned2021-02-17T19:38:12Z
dc.date.available2021-02-17T19:38:12Z
dc.date.issued2018-01
dc.identifier.issn1094-4087
dc.identifier.urihttps://hdl.handle.net/1721.1/129795
dc.description.abstractLaser sources in the mid-infrared are of great interest due to their wide applications in detection, sensing, communication and medicine. Silicon photonics is a promising technology which enables these laser devices to be fabricated in a standard CMOS foundry, with the advantages of reliability, compactness, low cost and large-scale production. In this paper, we demonstrate a holmium-doped distributed feedback laser monolithically integrated on a silicon photonics platform. The Al₂O₃:Ho³⁺ glass is used as gain medium, which provides broadband emission around 2 µm. By varying the distributed feedback grating period and Al₂O₃:Ho³⁺ gain layer thickness, we show single mode laser emission at wavelengths ranging from 2.02 to 2.10 µm. Using a 1950 nm pump, we measure a maximum output power of 15 mW, a slope efficiency of 2.3% and a side-mode suppression ratio in excess of 50 dB. The introduction of a scalable monolithic light source emitting at < 2 µm is a significant step for silicon photonic microsystems operating in this highly promising wavelength region.en_US
dc.description.sponsorshipDefense Advanced Research Projects Agency (Grants HR0011- 12-2-0007 and HR0011-15-C-0056)en_US
dc.language.isoen
dc.publisherOptical Society of America (OSA)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/oe.26.002220en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOSA Publishingen_US
dc.titleBroadband 2-µm emission on silicon chips: monolithically integrated Holmium lasersen_US
dc.typeArticleen_US
dc.identifier.citationLi, Nanxi et al. "Broadband 2-µm emission on silicon chips: monolithically integrated Holmium lasers." Optics Express 26, 3 (January 2018): 2220-2230 © 2018 Optical Society of Americaen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.departmentLincoln Laboratoryen_US
dc.relation.journalOptics Expressen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2020-02-28T15:53:26Z
dspace.date.submission2020-02-28T15:53:31Z
mit.journal.volume26en_US
mit.journal.issue3en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusComplete


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