Show simple item record

dc.contributor.authorTsymbalov, Evgenii
dc.contributor.authorShi, Zhe
dc.contributor.authorDao, Ming
dc.contributor.authorSuresh, Subra
dc.contributor.authorLi, Ju
dc.contributor.authorShapeev, Alexander
dc.date.accessioned2021-10-27T20:24:21Z
dc.date.available2021-10-27T20:24:21Z
dc.date.issued2021
dc.identifier.urihttps://hdl.handle.net/1721.1/135630
dc.description.abstract<jats:title>Abstract</jats:title><jats:p>The controlled introduction of elastic strains is an appealing strategy for modulating the physical properties of semiconductor materials. With the recent discovery of large elastic deformation in nanoscale specimens as diverse as silicon and diamond, employing this strategy to improve device performance necessitates first-principles computations of the fundamental electronic band structure and target figures-of-merit, through the design of an optimal straining pathway. Such simulations, however, call for approaches that combine deep learning algorithms and physics of deformation with band structure calculations to custom-design electronic and optical properties. Motivated by this challenge, we present here details of a machine learning framework involving convolutional neural networks to represent the topology and curvature of band structures in <jats:bold>k</jats:bold>-space. These calculations enable us to identify ways in which the physical properties can be altered through “deep” elastic strain engineering up to a large fraction of the ideal strain. Algorithms capable of active learning and informed by the underlying physics were presented here for predicting the bandgap and the band structure. By training a surrogate model with ab initio computational data, our method can identify the most efficient strain energy pathway to realize physical property changes. The power of this method is further demonstrated with results from the prediction of strain states that influence the effective electron mass. We illustrate the applications of the method with specific results for diamonds, although the general deep learning technique presented here is potentially useful for optimizing the physical properties of a wide variety of semiconductor materials.</jats:p>
dc.language.isoen
dc.publisherSpringer Science and Business Media LLC
dc.relation.isversionof10.1038/s41524-021-00538-0
dc.rightsCreative Commons Attribution 4.0 International license
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.sourceNature
dc.titleMachine learning for deep elastic strain engineering of semiconductor electronic band structure and effective mass
dc.typeArticle
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineering
dc.relation.journalnpj Computational Materials
dc.eprint.versionFinal published version
dc.type.urihttp://purl.org/eprint/type/JournalArticle
eprint.statushttp://purl.org/eprint/status/PeerReviewed
dc.date.updated2021-08-10T17:22:14Z
dspace.orderedauthorsTsymbalov, E; Shi, Z; Dao, M; Suresh, S; Li, J; Shapeev, A
dspace.date.submission2021-08-10T17:22:15Z
mit.journal.volume7
mit.journal.issue1
mit.licensePUBLISHER_CC
mit.metadata.statusAuthority Work and Publication Information Needed


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record