| dc.contributor.author | Staerz, Anna | |
| dc.contributor.author | Seo, Han Gil | |
| dc.contributor.author | Defferriere, Thomas | |
| dc.contributor.author | Tuller, Harry L | |
| dc.date.accessioned | 2022-03-07T15:37:04Z | |
| dc.date.available | 2022-03-07T15:37:04Z | |
| dc.date.issued | 2022-02-08 | |
| dc.identifier.uri | https://hdl.handle.net/1721.1/141037 | |
| dc.description.abstract | In this review, we consider the detrimental effects of Si-contamination on electrochemical applications, broadly conceived, in which both ions and electrons play key roles in device operation and where exchange of oxygen between the gas and solid phase is likewise essential for operation. | en_US |
| dc.language.iso | en | |
| dc.publisher | Royal Society of Chemistry (RSC) | en_US |
| dc.relation.isversionof | 10.1039/d1ta08469k | en_US |
| dc.rights | Creative Commons Attribution NonCommercial License 3.0 | en_US |
| dc.rights.uri | https://creativecommons.org/licenses/by-nc/3.0/ | en_US |
| dc.source | Royal Society of Chemistry (RSC) | en_US |
| dc.title | Silica: ubiquitous poison of metal oxide interfaces | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Staerz, Anna, Seo, Han Gil, Defferriere, Thomas and Tuller, Harry L. 2022. "Silica: ubiquitous poison of metal oxide interfaces." Journal of Materials Chemistry A, 10 (6). | |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.relation.journal | Journal of Materials Chemistry A | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dc.date.updated | 2022-03-07T15:29:35Z | |
| dspace.orderedauthors | Staerz, A; Seo, HG; Defferriere, T; Tuller, HL | en_US |
| dspace.date.submission | 2022-03-07T15:29:39Z | |
| mit.journal.volume | 10 | en_US |
| mit.journal.issue | 6 | en_US |
| mit.license | PUBLISHER_CC | |
| mit.metadata.status | Authority Work and Publication Information Needed | en_US |
