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dc.contributor.authorShih, Pao-Chuan
dc.contributor.authorEngel, Zachary
dc.contributor.authorAhmad, Habib
dc.contributor.authorDoolittle, William Alan
dc.contributor.authorPalacios, Tomás
dc.date.accessioned2022-04-19T15:43:03Z
dc.date.available2022-04-19T15:43:03Z
dc.date.issued2022-01-10
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttps://hdl.handle.net/1721.1/141928
dc.description.sponsorshipDepartment of Defense (DoD)en_US
dc.publisherAIP Publishingen_US
dc.relation.isversionof10.1063/5.0074443en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourcePao-Chuan Shihen_US
dc.subjectPhysics and Astronomy (miscellaneous)en_US
dc.titleWet-based digital etching on GaN and AlGaNen_US
dc.typeArticleen_US
dc.identifier.citationShih, Pao-Chuan, Engel, Zachary, Ahmad, Habib, Doolittle, William Alan and Palacios, Tomás. 2022. "Wet-based digital etching on GaN and AlGaN." Applied Physics Letters, 120 (2).
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratories
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.identifier.doi10.1063/5.0074443
dspace.date.submission2022-04-19T02:03:02Z
mit.journal.volume120en_US
mit.journal.issue2en_US
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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