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dc.contributor.authorChrysler, M
dc.contributor.authorGabel, J
dc.contributor.authorLee, T-L
dc.contributor.authorPenn, AN
dc.contributor.authorMatthews, BE
dc.contributor.authorKepaptsoglou, DM
dc.contributor.authorRamasse, QM
dc.contributor.authorPaudel, JR
dc.contributor.authorSah, RK
dc.contributor.authorGrassi, JD
dc.contributor.authorZhu, Z
dc.contributor.authorGray, AX
dc.contributor.authorLeBeau, JM
dc.contributor.authorSpurgeon, SR
dc.contributor.authorChambers, SA
dc.contributor.authorSushko, PV
dc.contributor.authorNgai, JH
dc.date.accessioned2022-05-19T17:15:18Z
dc.date.available2022-05-19T17:15:18Z
dc.date.issued2021
dc.identifier.urihttps://hdl.handle.net/1721.1/142615
dc.language.isoen
dc.publisherAmerican Physical Society (APS)en_US
dc.relation.isversionof10.1103/PHYSREVMATERIALS.5.104603en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAPSen_US
dc.titleTuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipoleen_US
dc.typeArticleen_US
dc.identifier.citationChrysler, M, Gabel, J, Lee, T-L, Penn, AN, Matthews, BE et al. 2021. "Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole." Physical Review Materials, 5 (10).
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.relation.journalPhysical Review Materialsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-05-19T17:04:55Z
dspace.orderedauthorsChrysler, M; Gabel, J; Lee, T-L; Penn, AN; Matthews, BE; Kepaptsoglou, DM; Ramasse, QM; Paudel, JR; Sah, RK; Grassi, JD; Zhu, Z; Gray, AX; LeBeau, JM; Spurgeon, SR; Chambers, SA; Sushko, PV; Ngai, JHen_US
dspace.date.submission2022-05-19T17:04:59Z
mit.journal.volume5en_US
mit.journal.issue10en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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