dc.contributor.author | Miller, Matthew J. | |
dc.contributor.author | Cabral, Matthew J. | |
dc.contributor.author | Dickey, Elizabeth C. | |
dc.contributor.author | LeBeau, James M. | |
dc.contributor.author | Reich, Brian J. | |
dc.date.accessioned | 2022-05-31T20:44:33Z | |
dc.date.available | 2022-05-19T17:23:07Z | |
dc.date.available | 2022-05-31T20:44:33Z | |
dc.date.issued | 2021-04 | |
dc.date.submitted | 2019-07 | |
dc.identifier.issn | 0040-1706 | |
dc.identifier.issn | 1537-2723 | |
dc.identifier.uri | https://hdl.handle.net/1721.1/142616.2 | |
dc.language.iso | en | |
dc.publisher | Informa UK Limited | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1080/00401706.2021.1905070 | en_US |
dc.rights | Attribution-NonCommercial-ShareAlike 4.0 International | en_US |
dc.rights.uri | https://creativecommons.org/licenses/by-nc-sa/4.0/ | en_US |
dc.source | arXiv | en_US |
dc.title | Accounting for Location Measurement Error in Imaging Data With Application to Atomic Resolution Images of Crystalline Materials | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Miller, Matthew J, Cabral, Matthew J, Dickey, Elizabeth C, LeBeau, James M and Reich, Brian J. 2022. "Accounting for Location Measurement Error in Imaging Data With Application to Atomic Resolution Images of Crystalline Materials." Technometrics, 64 (1). | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
dc.relation.journal | Technometrics | en_US |
dc.eprint.version | Original manuscript | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/NonPeerReviewed | en_US |
dc.date.updated | 2022-05-19T17:15:04Z | |
dspace.orderedauthors | Miller, MJ; Cabral, MJ; Dickey, EC; LeBeau, JM; Reich, BJ | en_US |
dspace.date.submission | 2022-05-19T17:15:05Z | |
mit.journal.volume | 64 | en_US |
mit.journal.issue | 1 | en_US |
mit.license | OPEN_ACCESS_POLICY | |
mit.metadata.status | Authority Work Needed | en_US |