| dc.contributor.author | Song, Qichen | |
| dc.contributor.author | Zhou, Jiawei | |
| dc.contributor.author | Chen, Gang | |
| dc.date.accessioned | 2022-06-21T15:15:15Z | |
| dc.date.available | 2022-06-21T15:15:15Z | |
| dc.date.issued | 2022-05-11 | |
| dc.identifier.issn | 2469-9950 | |
| dc.identifier.issn | 2469-9969 | |
| dc.identifier.uri | https://hdl.handle.net/1721.1/143487 | |
| dc.description.sponsorship | National Science Foundation (NSF) | en_US |
| dc.publisher | American Physical Society (APS) | en_US |
| dc.relation.isversionof | 10.1103/physrevb.105.195306 | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | APS | en_US |
| dc.title | Significant reduction in semiconductor interface resistance via interfacial atomic mixing | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Song, Qichen, Zhou, Jiawei and Chen, Gang. 2022. "Significant reduction in semiconductor interface resistance via interfacial atomic mixing." Physical Review B, 105 (19). | |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | |
| dc.relation.journal | Physical Review B | en_US |
| dc.eprint.version | Final published version | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dc.identifier.doi | 10.1103/PhysRevB.105.195306 | |
| dspace.date.submission | 2022-05-16T13:58:39Z | |
| mit.journal.volume | 105 | en_US |
| mit.journal.issue | 19 | en_US |
| mit.license | PUBLISHER_POLICY | |
| mit.metadata.status | Authority Work and Publication Information Needed | en_US |
