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dc.contributor.authorXie, Qingyun
dc.contributor.authorYuan, Mengyang
dc.contributor.authorNiroula, John
dc.contributor.authorGreer, James A.
dc.contributor.authorRajput, Nitul S.
dc.contributor.authorChowdhury, Nadim
dc.contributor.authorPalacios, Tomas
dc.date.accessioned2023-04-24T15:03:37Z
dc.date.available2023-04-24T15:03:37Z
dc.date.issued2022-12-03
dc.identifier.urihttps://hdl.handle.net/1721.1/150552
dc.description.sponsorshipDepartment of Energy (DOE)en_US
dc.description.sponsorshipNational Aeronautics and Space Administration (NASA)en_US
dc.description.sponsorshipIntel Corp.en_US
dc.publisherIEEEen_US
dc.relation.isversionof10.1109/iedm45625.2022.10019401en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttps://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceQingyun Xieen_US
dc.titleHighly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platformen_US
dc.typeArticleen_US
dc.identifier.citationXie, Qingyun, Yuan, Mengyang, Niroula, John, Greer, James A., Rajput, Nitul S. et al. 2022. "Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform." 2022 International Electron Devices Meeting (IEDM).
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.relation.journal2022 International Electron Devices Meeting (IEDM)en_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.date.submission2023-04-23T17:35:06Z
mit.licenseOPEN_ACCESS_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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