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dc.contributor.authorTsang, Mankei
dc.date.accessioned2009-10-21T13:59:16Z
dc.date.available2009-10-21T13:59:16Z
dc.date.issued2009-06
dc.date.submitted2009-03
dc.identifier.issn0031-9007
dc.identifier.urihttp://hdl.handle.net/1721.1/49506
dc.description.abstractI propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multi-photon absorber or coincidence detection. Using the same non-classical states of light as those for quantum lithography, the proposed method requires only optical intensity measurements, followed by image post-processing, to produce the same complex quantum interference patterns as those in quantum lithography. The method is expected to be experimentally realizable using current technology.en
dc.language.isoen_US
dc.publisherAmerican Physical Societyen
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevLett.102.253601en
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en
dc.sourcearXiven
dc.titleQuantum Imaging beyond the Diffraction Limit by Optical Centroid Measurementsen
dc.typeArticleen
dc.identifier.citationTsang, Mankei. “Quantum Imaging beyond the Diffraction Limit by Optical Centroid Measurements.” Physical Review Letters 102.25 (2009): 253601-4.en
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.approverTsang, Mankei
dc.contributor.mitauthorTsang, Mankei
dc.relation.journalPhysical review lettersen
dc.eprint.versionAuthor's final manuscript
dc.type.urihttp://purl.org/eprint/type/SubmittedJournalArticleen
eprint.statushttp://purl.org/eprint/status/PeerRevieweden
dspace.orderedauthorsTsang, Mankeien
dc.identifier.orcidhttps://orcid.org/0000-0001-7173-1239
mit.licensePUBLISHER_POLICYen
mit.metadata.statusComplete


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