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dc.contributor.authorChen, Hongsheng
dc.contributor.authorZhang, Baile
dc.contributor.authorLuo, Yu
dc.contributor.authorKemp, Brandon A.
dc.contributor.authorZhang, Jingjing
dc.contributor.authorRan, Lixin
dc.contributor.authorWu, Bae-Ian
dc.date.accessioned2010-03-12T18:08:04Z
dc.date.available2010-03-12T18:08:04Z
dc.date.issued2009-05
dc.date.submitted2009-07
dc.identifier.issn1094-1622
dc.identifier.issn1050-2947
dc.identifier.urihttp://hdl.handle.net/1721.1/52546
dc.description.abstractThe mechanical behavior of a transformation based spherical cloak under wave illumination is derived. We show that the equatorial region of the cloak is subject to much higher stress than the polar regions, where the polar axis is defined along the wave propagation direction. These forces do not exist before transformation but stem from the squeezed electromagnetic space. The trajectory of the ray can be interpreted as a result of the recoil force that the cloak exerts upon the ray. The total radiation pressure on an ideal cloak is shown to be exactly zero, effecting a stationary cloak.en
dc.description.sponsorshipUnited States. Office of Naval Research (Grant No. N00014-06-1-0001)en
dc.description.sponsorshipMEC (Grant No. 200803351025)en
dc.description.sponsorshipZJNSF (Grant No. R1080320)en
dc.description.sponsorshipNCET-07-0750en
dc.description.sponsorshipNSFC (Grants No. 60531020 and No. 60801005)en
dc.language.isoen_US
dc.publisherAmerican Physical Societyen
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevA.80.011808en
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en
dc.sourceAPSen
dc.titleLorentz force and radiation pressure on a spherical cloaken
dc.typeArticleen
dc.identifier.citationChen, Hongsheng et al. “Lorentz force and radiation pressure on a spherical cloak.” Physical Review A 80.1 (2009): 011808. © 2009 The American Physical Societyen
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen
dc.contributor.approverZhang, Baile
dc.contributor.mitauthorChen, Hongsheng
dc.contributor.mitauthorZhang, Baile
dc.contributor.mitauthorKemp, Brandon A.
dc.contributor.mitauthorWu, Bae-Ian
dc.relation.journalPhysical Review Aen
dc.eprint.versionFinal published versionen
dc.type.urihttp://purl.org/eprint/type/JournalArticleen
eprint.statushttp://purl.org/eprint/status/PeerRevieweden
dspace.orderedauthorsChen, Hongsheng; Zhang, Baile; Luo, Yu; Kemp, Brandon; Zhang, Jingjing; Ran, Lixin; Wu, Bae-Ianen
mit.licensePUBLISHER_POLICYen
mit.metadata.statusComplete


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