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Fabrication and characterization of As[subscript 2]S[subscript 3]/Y[subscript 3]Fe[subscript 5]O[subscript 12] and Y[subscript 3]Fe[subscript 5]O[subscript 12]/SOI strip-loaded waveguides for integrated optical isolator applications

Author(s)
Ross, Caroline A.; Kimerling, Lionel C.; Hu, Juejun; Bi, Lei
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Alternative title
Fabrication and characterization of As2S3/Y3Fe5O12 and Y3Fe5O12/SOI strip-loaded waveguides for integrated optical isolator applications
Terms of use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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Abstract
We report two novel strategies to integrate magneto-optical oxides on oxidized silicon and SOI platforms based on strip-loaded waveguide structures. By using conventional waveguide fabrication and thin film deposition techniques, strip-loaded waveguides for magneto-optical non-reciprocal phase shift (NRPS) applications can be integrated on a silicon platform. As a demonstration, two structures, i.e. As[sub 2]S[sub 3]/Y[sub 3]Fe[sub 5]O[sub 12] (YIG) and YIG/SOI waveguides are fabricated. Using pulsed-laser deposition followed by rapid thermal annealing, yttrium iron oxide films in which more than 95 vol.% had crystallized into the YIG phase were achieved on both substrates. The optical loss of the As[sub 2]S[sub 3]/Y[sub 3]Fe[sub 5]O[sub 12] waveguide was characterized by a cut-back method to be ~10 dB/cm at 1550 nm, while the optical loss of a 450nm wide YIG/SOI waveguide was determined to be 41 dB/cm at 1550 nm by measuring the quality factor Q of a pulley-type ring resonator consisting of such waveguides. The propagation loss of polycrystalline YIG on a SiO[subscript 2]/Si substrate was around 50 dB/cm at 1550 nm wavelength. The NRPS and figure of merit of both waveguides were simulated. It is suggested that a Bi:YIG or Ce:YIG layer may be integrated in these waveguide structures to achieve a higher NRPS and figure of merit for optical isolator applications. These waveguide fabrication techniques offer a compact, low cost and etch-free route for integrating magneto-optical materials on a silicon platform, which may be useful for making future integrated optical isolators and other magneto-optical components.
Date issued
2010-01
URI
http://hdl.handle.net/1721.1/57496
Department
MIT Materials Research Laboratory; Massachusetts Institute of Technology. Department of Materials Science and Engineering
Journal
Integrated Optics: Devices, Materials, and Technologies XIV
Publisher
Society of Photo-optical Instrumentation Engineers
Citation
Bi, Lei et al. “Fabrication and characterization of As[sub 2]S[sub 3]/Y[sub 3]Fe[sub 5]O[sub 12] and Y[sub 3]Fe[sub 5]O[sub 12]/SOI strip-loaded waveguides for integrated optical isolator applications.” Integrated Optics: Devices, Materials, and Technologies XIV. Ed. Jean-Emmanuel Broquin & Christoph M. Greiner. San Francisco, California, USA: SPIE, 2010. 760406-10.©2010 SPIE--The International Society for Optical Engineering.
Version: Final published version
ISSN
0277-786X

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