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dc.contributor.authorRoss, Caroline A.
dc.contributor.authorKimerling, Lionel C.
dc.contributor.authorHu, Juejun
dc.contributor.authorBi, Lei
dc.date.accessioned2010-08-12T18:34:53Z
dc.date.available2010-08-12T18:34:53Z
dc.date.issued2010-01
dc.identifier.issn0277-786X
dc.identifier.urihttp://hdl.handle.net/1721.1/57496
dc.description.abstractWe report two novel strategies to integrate magneto-optical oxides on oxidized silicon and SOI platforms based on strip-loaded waveguide structures. By using conventional waveguide fabrication and thin film deposition techniques, strip-loaded waveguides for magneto-optical non-reciprocal phase shift (NRPS) applications can be integrated on a silicon platform. As a demonstration, two structures, i.e. As[sub 2]S[sub 3]/Y[sub 3]Fe[sub 5]O[sub 12] (YIG) and YIG/SOI waveguides are fabricated. Using pulsed-laser deposition followed by rapid thermal annealing, yttrium iron oxide films in which more than 95 vol.% had crystallized into the YIG phase were achieved on both substrates. The optical loss of the As[sub 2]S[sub 3]/Y[sub 3]Fe[sub 5]O[sub 12] waveguide was characterized by a cut-back method to be ~10 dB/cm at 1550 nm, while the optical loss of a 450nm wide YIG/SOI waveguide was determined to be 41 dB/cm at 1550 nm by measuring the quality factor Q of a pulley-type ring resonator consisting of such waveguides. The propagation loss of polycrystalline YIG on a SiO[subscript 2]/Si substrate was around 50 dB/cm at 1550 nm wavelength. The NRPS and figure of merit of both waveguides were simulated. It is suggested that a Bi:YIG or Ce:YIG layer may be integrated in these waveguide structures to achieve a higher NRPS and figure of merit for optical isolator applications. These waveguide fabrication techniques offer a compact, low cost and etch-free route for integrating magneto-optical materials on a silicon platform, which may be useful for making future integrated optical isolators and other magneto-optical components.en_US
dc.description.sponsorshipLincoln Laboratoryen_US
dc.description.sponsorshipNational Science Foundation. Division of Materials Researchen_US
dc.language.isoen_US
dc.publisherSociety of Photo-optical Instrumentation Engineersen_US
dc.relation.isversionofhttp://dx.doi.org/10.1117/12.841832en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceSPIEen_US
dc.titleFabrication and characterization of As[subscript 2]S[subscript 3]/Y[subscript 3]Fe[subscript 5]O[subscript 12] and Y[subscript 3]Fe[subscript 5]O[subscript 12]/SOI strip-loaded waveguides for integrated optical isolator applicationsen_US
dc.title.alternativeFabrication and characterization of As2S3/Y3Fe5O12 and Y3Fe5O12/SOI strip-loaded waveguides for integrated optical isolator applicationsen_US
dc.typeArticleen_US
dc.identifier.citationBi, Lei et al. “Fabrication and characterization of As[sub 2]S[sub 3]/Y[sub 3]Fe[sub 5]O[sub 12] and Y[sub 3]Fe[sub 5]O[sub 12]/SOI strip-loaded waveguides for integrated optical isolator applications.” Integrated Optics: Devices, Materials, and Technologies XIV. Ed. Jean-Emmanuel Broquin & Christoph M. Greiner. San Francisco, California, USA: SPIE, 2010. 760406-10.©2010 SPIE--The International Society for Optical Engineering.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Materials Processing Centeren_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.approverRoss, Caroline A.
dc.contributor.mitauthorRoss, Caroline A.
dc.contributor.mitauthorKimerling, Lionel C.
dc.contributor.mitauthorHu, Juejun
dc.contributor.mitauthorBi, Lei
dc.relation.journalIntegrated Optics: Devices, Materials, and Technologies XIVen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsBi, Lei; Hu, Juejun; Kimerling, Lionel; Ross, C. A.en
dc.identifier.orcidhttps://orcid.org/0000-0003-2262-1249
dc.identifier.orcidhttps://orcid.org/0000-0002-7233-3918
dc.identifier.orcidhttps://orcid.org/0000-0002-3913-6189
mit.licensePUBLISHER_POLICYen_US


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