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Electron-beam Directed Materials Assembly

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Author(s)
Fedynyshyn, Theodore H.
•
Kingsborough, Richard P.
•
Goodman, Russell B.
•
Astolfi, David K.
Date Issued
April 2010
Journal
Proceedings of SPIE--the International Society for Optical Engineering, v. 7637
Publisher
SPIE
Citation
Kingsborough, Richard P. et al. “Electron-beam directed materials assembly.” Alternative Lithographic Technologies II. Ed. Daniel J. C. Herr. ©2010 SPIE
Version
Final published version
Abstract
We have developed a processing method that employs direct surface imaging of a surface-modified silicon wafer to define a chemical nanopattern that directs material assembly, eliminating most of the traditional processing steps. Defining areas of high and low surface energy by selective alkylsiloxane removal that match the polymer period length leads to defect-free grating structures of poly(styrene-block-methyl methacrylate) (PS-b-PMMA). We have performed initial studies to extend this concept to other wavelengths beyond 157 nm. In this present paper, we will show that electron beam lithography can also be used to define chemical nanopatterns to direct the assembly of PS-b-PMMA films. Half-pitch patterns resulted in the directed assembly of PS-b-PMMA films. Electron beam lithography can also be used to prepare surfaces for pitch division. Instead of the deposition of an HSQ pinning structure as is currently done, we will show that by writing an asymmetric pattern, we can fill in the space with smaller lamellar period block copolymers to shrink the overall pitch and allow for 15-nm features.
Subjects
Block copolymer
Directed self-assembly
MIT Department
Lincoln Laboratory
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Persistent DSpace Link
http://hdl.handle.net/1721.1/58610
DOI of Published Version
https://doi.org/10.1117/12.846000
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