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dc.contributor.authorGogineni, Usha
dc.contributor.authordel Alamo, Jesus A.
dc.contributor.authorPutnam, Christopher
dc.contributor.authorGreenberg, David
dc.date.accessioned2010-11-04T15:02:06Z
dc.date.available2010-11-04T15:02:06Z
dc.date.issued2010-11
dc.identifier.urihttp://hdl.handle.net/1721.1/59812
dc.description.abstractThis paper presents a model for the frequency response of 65 nm RF power CMOS devices as a function of device width. We find that the cut-off frequency (f[subscript T]) and maximum oscillation frequency (f[subscript max]) decrease with increasing device width. Small-signal equivalent circuit extractions reveal that the main reason for the degradation in f[subscript T] and f[subscript max] is the presence of non-scalable parasitic resistances in the gate and drain of wide devices. Simplified expressions for f[subscript T] and f[subscript max] that include these parasitic effects have been derived and shown to be very accurate.en_US
dc.language.isoen_US
dc.rightsAttribution-Noncommercial-Share Alike 3.0 Unporteden_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/en_US
dc.sourceMIT web domainen_US
dc.titleModeling frequency response of 65 nm CMOS RF power devicesen_US
dc.typeArticleen_US
dc.identifier.citationGogineni, Usha, et al. “Modeling frequency response of 65 nm CMOS RF power devices.”en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.approverdel Alamo, Jesus A.
dc.contributor.mitauthorGogineni, Usha
dc.contributor.mitauthordel Alamo, Jesus A.
dc.eprint.versionOriginal manuscripten_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
dspace.orderedauthorsGogineni, Usha; del Alamo, Jesus; Putnam, Christopher; Greenberg, David
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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