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Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process

Author(s)
Boning, Duane S.; Taylor, Hayden Kingsley; Youcef-Toumi, Kamal; Xu, Zhiguang; Yoon, Soon Fatt
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Abstract
A moiré fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 μm is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top of the sample, a moiré fringe pattern is observed and recorded by a document scanner. The deviation of the intersections of the fringes from their ideal positions presents the residual distortion in the sample. With different sample-reference rotation angles eight images are acquired for the same sample to achieve the optimal result by a data fitting technique. The validity of this method is proved by the self-consistency of the results from the eight images. To the best of our knowledge, this is the first time distortion quantification has been achieved both in a large area up to that of a scanner and with a high resolution at the level of 1 μm. Furthermore, we do not use any expensive instrument, nor need to measure the sample–reference rotation angle or position the sample precisely, and the process is run automatically by a computer instead of manual operation.
Date issued
2009-09
URI
http://hdl.handle.net/1721.1/71162
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science; Massachusetts Institute of Technology. Department of Mechanical Engineering
Journal
Optics Express
Publisher
Optical Society of America
Citation
Xu, Zhiguang et al. “Large-area and High-resolution Distortion Measurement Based on Moiré Fringe Method for Hot Embossing Process.” Optics Express 17.21 (2009): 18394. © Copyright 2009 The Optical Society
Version: Final published version
ISSN
1094-4087

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