Show simple item record

dc.contributor.authorBoning, Duane S.
dc.contributor.authorTaylor, Hayden Kingsley
dc.contributor.authorYoucef-Toumi, Kamal
dc.contributor.authorXu, Zhiguang
dc.contributor.authorYoon, Soon Fatt
dc.date.accessioned2012-06-15T13:31:57Z
dc.date.available2012-06-15T13:31:57Z
dc.date.issued2009-09
dc.date.submitted2009-07
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1721.1/71162
dc.description.abstractA moiré fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 μm is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top of the sample, a moiré fringe pattern is observed and recorded by a document scanner. The deviation of the intersections of the fringes from their ideal positions presents the residual distortion in the sample. With different sample-reference rotation angles eight images are acquired for the same sample to achieve the optimal result by a data fitting technique. The validity of this method is proved by the self-consistency of the results from the eight images. To the best of our knowledge, this is the first time distortion quantification has been achieved both in a large area up to that of a scanner and with a high resolution at the level of 1 μm. Furthermore, we do not use any expensive instrument, nor need to measure the sample–reference rotation angle or position the sample precisely, and the process is run automatically by a computer instead of manual operation.en_US
dc.description.sponsorshipSingapore-MIT Allianceen_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OE.17.018394en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleLarge-area and high-resolution distortion measurement based on moire fringe method for hot embossing processen_US
dc.typeArticleen_US
dc.identifier.citationXu, Zhiguang et al. “Large-area and High-resolution Distortion Measurement Based on Moiré Fringe Method for Hot Embossing Process.” Optics Express 17.21 (2009): 18394. © Copyright 2009 The Optical Societyen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.approverBoning, Duane S.
dc.contributor.mitauthorBoning, Duane S.
dc.contributor.mitauthorTaylor, Hayden Kingsley
dc.contributor.mitauthorYoucef-Toumi, Kamal
dc.contributor.mitauthorXu, Zhiguang
dc.relation.journalOptics Expressen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsXu, Zhiguang; Taylor, Hayden K.; Boning, Duane S.; Yoon, Soon Fatt; Youcef-Toumi, Kamalen
dc.identifier.orcidhttps://orcid.org/0000-0002-0417-445X
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record