Processing and properties of ytterbium-erbium silicate thin film gain media

Author(s)
Vanhoutte, Michiel; Wang, Bing; Michel, Jurgen; Kimerling, Lionel C.
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Abstract
The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er[subscript 2]O[subscript 3], Yb[subscript 2]O[subscript 3] and SiO[subscript 2] on c-Si and subsequent annealing in N[subscript 2] or O[subscript 2] atmosphere.
Date issued
2009-09
URI
http://hdl.handle.net/1721.1/73453
Department
MIT Materials Research Laboratory; Massachusetts Institute of Technology. Department of Materials Science and Engineering; Massachusetts Institute of Technology. Microphotonics Center
Journal
Proceedings of the 6th IEEE International Conference on Group IV Photonics, 2009 (GFP '09)
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
Vanhoutte, Michiel et al. “Processing and properties of ytterbium-erbium silicate thin film gain media.” IEEE, 2009. 63-65. © Copyright 2009 IEEE
Version: Final published version
ISBN
978-1-4244-4403-8
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