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dc.contributor.authorNewman, Bonna Kay
dc.contributor.authorBuonassisi, Tonio
dc.contributor.authorSher, Meng-Ju
dc.contributor.authorMazur, Eric
dc.date.accessioned2013-03-28T15:34:14Z
dc.date.available2013-03-28T15:34:14Z
dc.date.issued2011-06
dc.date.submitted2010-12
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/78013
dc.description.abstractSilicon doped with nonequilibrium concentrations of chalcogens using a femtosecond laser exhibits near-unity absorption of sub-bandgap photons to wavelengths of at least 2500 nm. Previous studies have shown that sub-bandgap absorptance decreases with thermal annealing up to 1175 K and that the absorption deactivation correlates with chalcogen diffusivity. In this work, we show that sub-bandgap absorptance can be reactivated by annealing at temperatures between 1350 and 1550 K followed by fast cooling (>50 K/s). Our results suggest that the defects responsible for sub-bandgap absorptance are in equilibrium at high temperatures in hyperdoped Si:chalcogen systems.en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Contract CBET 0754227)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Contract CHE-DMR-DMS 0934480)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3599450en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleReactivation of sub-bandgap absorption in chalcogen-hyperdoped siliconen_US
dc.typeArticleen_US
dc.identifier.citationNewman, Bonna K. et al. “Reactivation of Sub-bandgap Absorption in Chalcogen-hyperdoped Silicon.” Applied Physics Letters 98.25 (2011): 251905. © 2011 American Institute of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.mitauthorNewman, Bonna Kay
dc.contributor.mitauthorBuonassisi, Tonio
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsNewman, Bonna K.; Sher, Meng-Ju; Mazur, Eric; Buonassisi, Tonioen
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
dspace.mitauthor.errortrue
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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