| dc.contributor.author | Newman, Bonna Kay | |
| dc.contributor.author | Buonassisi, Tonio | |
| dc.contributor.author | Sher, Meng-Ju | |
| dc.contributor.author | Mazur, Eric | |
| dc.date.accessioned | 2013-03-28T15:34:14Z | |
| dc.date.available | 2013-03-28T15:34:14Z | |
| dc.date.issued | 2011-06 | |
| dc.date.submitted | 2010-12 | |
| dc.identifier.issn | 0003-6951 | |
| dc.identifier.issn | 1077-3118 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/78013 | |
| dc.description.abstract | Silicon doped with nonequilibrium concentrations of chalcogens using a femtosecond laser exhibits near-unity absorption of sub-bandgap photons to wavelengths of at least 2500 nm. Previous studies have shown that sub-bandgap absorptance decreases with thermal annealing up to 1175 K and that the absorption deactivation correlates with chalcogen diffusivity. In this work, we show that sub-bandgap absorptance can be reactivated by annealing at temperatures between 1350 and 1550 K followed by fast cooling (>50 K/s). Our results suggest that the defects responsible for sub-bandgap absorptance are in equilibrium at high temperatures in hyperdoped Si:chalcogen systems. | en_US |
| dc.description.sponsorship | National Science Foundation (U.S.) (Contract CBET 0754227) | en_US |
| dc.description.sponsorship | National Science Foundation (U.S.) (Contract CHE-DMR-DMS 0934480) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | American Institute of Physics (AIP) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1063/1.3599450 | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | MIT web domain | en_US |
| dc.title | Reactivation of sub-bandgap absorption in chalcogen-hyperdoped silicon | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Newman, Bonna K. et al. “Reactivation of Sub-bandgap Absorption in Chalcogen-hyperdoped Silicon.” Applied Physics Letters 98.25 (2011): 251905. © 2011 American Institute of Physics | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | en_US |
| dc.contributor.mitauthor | Newman, Bonna Kay | |
| dc.contributor.mitauthor | Buonassisi, Tonio | |
| dc.relation.journal | Applied Physics Letters | en_US |
| dc.eprint.version | Final published version | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dspace.orderedauthors | Newman, Bonna K.; Sher, Meng-Ju; Mazur, Eric; Buonassisi, Tonio | en |
| dc.identifier.orcid | https://orcid.org/0000-0001-8345-4937 | |
| dspace.mitauthor.error | true | |
| mit.license | PUBLISHER_POLICY | en_US |
| mit.metadata.status | Complete | |