dc.contributor.author | Wang, Jianfei | |
dc.contributor.author | Hu, Juejun | |
dc.contributor.author | Becla, Piotr | |
dc.contributor.author | Kimerling, Lionel C. | |
dc.contributor.author | Agarwal, Anuradha Murthy | |
dc.date.accessioned | 2013-07-30T18:34:43Z | |
dc.date.available | 2013-07-30T18:34:43Z | |
dc.date.issued | 2011-10 | |
dc.date.submitted | 2011-05 | |
dc.identifier.issn | 00218979 | |
dc.identifier.issn | 1089-7550 | |
dc.identifier.uri | http://hdl.handle.net/1721.1/79729 | |
dc.description.abstract | In this paper, we report large mid-wave infrared photoconductivity in highly textured, nanocrystalline PbTe films thermally evaporated on Si at room temperature. Responsivity as high as 25 V/W is measured at the 3.5 μm wavelength. The large photoconductivity is attributed to the oxygen incorporation in the films by diffusion. Carrier concentration as low as 10[superscript 17] cm[superscript −3] is identified to be the consequence of Fermi level pinning induced by the diffused oxygen. The successful demonstration of IR-sensitive PbTe films without the need for high-temperature processing presents an important step toward monolithic integration of mid-wave PbTe infrared detectors on Si read-out integrated circuits (ROICs). | en_US |
dc.language.iso | en_US | |
dc.publisher | American Institute of Physics (AIP) | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1063/1.3653832 | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | MIT web domain | en_US |
dc.title | Room-temperature oxygen sensitization in highly textured, nanocrystalline PbTe films: A mechanistic study | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Wang, Jianfei, Juejun Hu, Piotr Becla, Anuradha M. Agarwal, and Lionel C. Kimerling. “Room-temperature oxygen sensitization in highly textured, nanocrystalline PbTe films: A mechanistic study.” Journal of Applied Physics 110, no. 8 (2011): 083719. © 2011 American Institute of Physics | en_US |
dc.contributor.department | MIT Materials Research Laboratory | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Microphotonics Center | en_US |
dc.contributor.mitauthor | Wang, Jianfei | en_US |
dc.contributor.mitauthor | Hu, Juejun | en_US |
dc.contributor.mitauthor | Becla, Piotr | en_US |
dc.contributor.mitauthor | Agarwal, Anuradha Murthy | en_US |
dc.contributor.mitauthor | Kimerling, Lionel C. | en_US |
dc.relation.journal | Journal of Applied Physics | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dspace.orderedauthors | Wang, Jianfei; Hu, Juejun; Becla, Piotr; Agarwal, Anuradha M.; Kimerling, Lionel C. | en_US |
dc.identifier.orcid | https://orcid.org/0000-0002-7233-3918 | |
dc.identifier.orcid | https://orcid.org/0000-0002-0769-0652 | |
dc.identifier.orcid | https://orcid.org/0000-0002-3913-6189 | |
mit.license | PUBLISHER_POLICY | en_US |
mit.metadata.status | Complete | |