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dc.contributor.authorWang, Jianfei
dc.contributor.authorHu, Juejun
dc.contributor.authorBecla, Piotr
dc.contributor.authorKimerling, Lionel C.
dc.contributor.authorAgarwal, Anuradha Murthy
dc.date.accessioned2013-07-30T18:34:43Z
dc.date.available2013-07-30T18:34:43Z
dc.date.issued2011-10
dc.date.submitted2011-05
dc.identifier.issn00218979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/1721.1/79729
dc.description.abstractIn this paper, we report large mid-wave infrared photoconductivity in highly textured, nanocrystalline PbTe films thermally evaporated on Si at room temperature. Responsivity as high as 25 V/W is measured at the 3.5 μm wavelength. The large photoconductivity is attributed to the oxygen incorporation in the films by diffusion. Carrier concentration as low as 10[superscript 17] cm[superscript −3] is identified to be the consequence of Fermi level pinning induced by the diffused oxygen. The successful demonstration of IR-sensitive PbTe films without the need for high-temperature processing presents an important step toward monolithic integration of mid-wave PbTe infrared detectors on Si read-out integrated circuits (ROICs).en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3653832en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleRoom-temperature oxygen sensitization in highly textured, nanocrystalline PbTe films: A mechanistic studyen_US
dc.typeArticleen_US
dc.identifier.citationWang, Jianfei, Juejun Hu, Piotr Becla, Anuradha M. Agarwal, and Lionel C. Kimerling. “Room-temperature oxygen sensitization in highly textured, nanocrystalline PbTe films: A mechanistic study.” Journal of Applied Physics 110, no. 8 (2011): 083719. © 2011 American Institute of Physicsen_US
dc.contributor.departmentMIT Materials Research Laboratoryen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microphotonics Centeren_US
dc.contributor.mitauthorWang, Jianfeien_US
dc.contributor.mitauthorHu, Juejunen_US
dc.contributor.mitauthorBecla, Piotren_US
dc.contributor.mitauthorAgarwal, Anuradha Murthyen_US
dc.contributor.mitauthorKimerling, Lionel C.en_US
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsWang, Jianfei; Hu, Juejun; Becla, Piotr; Agarwal, Anuradha M.; Kimerling, Lionel C.en_US
dc.identifier.orcidhttps://orcid.org/0000-0002-7233-3918
dc.identifier.orcidhttps://orcid.org/0000-0002-0769-0652
dc.identifier.orcidhttps://orcid.org/0000-0002-3913-6189
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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