| dc.contributor.author | Vanhoutte, Michiel | |
| dc.contributor.author | Wang, Bing | |
| dc.contributor.author | Zhou, Zhiping | |
| dc.contributor.author | Michel, Jurgen | |
| dc.contributor.author | Kimerling, Lionel C. | |
| dc.date.accessioned | 2013-08-05T14:07:10Z | |
| dc.date.available | 2013-08-05T14:07:10Z | |
| dc.date.issued | 2010-09 | |
| dc.identifier.isbn | 978-1-4244-6344-2 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/79771 | |
| dc.description.abstract | Sensitization of erbium by ytterbium in Er[subscript x]Yb[subscript 2-x]SiO[subscript 5] thin films at 980nm optical excitation is demonstrated by means of comparison of the 1.54μm photoluminescence intensities excited with 488nm and 980nm light. Additionally, it is shown that detrimental Er-Er interactions such as concentration quenching increase non-radiative decay rates at high erbium concentrations. Dilution of erbium by ytterbium reduces these interactions, leading to an increase of internal quantum efficiency. | en_US |
| dc.description.sponsorship | United States. Air Force Office of Scientific Research. Multidisciplinary University Research Initiative (Si-based Laser Initiative) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1109/GROUP4.2010.5643345 | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | MIT web domain | en_US |
| dc.title | Direct demonstration of sensitization at 980nm optical excitation in erbium-ytterbium silicates | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Vanhoutte, Michiel, Bing Wang, Zhiping Zhou, Jurgen Michel, and Lionel C. Kimerling. “Direct demonstration of sensitization at 980nm optical excitation in erbium-ytterbium silicates.” In 7th IEEE International Conference on Group IV Photonics, 308-310. Institute of Electrical and Electronics Engineers, 2010. © Copyright 2010 IEEE | en_US |
| dc.contributor.department | MIT Materials Research Laboratory | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Microphotonics Center | en_US |
| dc.contributor.mitauthor | Vanhoutte, Michiel | en_US |
| dc.contributor.mitauthor | Wang, Bing | en_US |
| dc.contributor.mitauthor | Zhou, Zhiping | en_US |
| dc.contributor.mitauthor | Michel, Jurgen | en_US |
| dc.contributor.mitauthor | Kimerling, Lionel C. | en_US |
| dc.relation.journal | Proceedings of the Group IV Photonics (GFP), 2010 7th IEEE International Conference on | en_US |
| dc.eprint.version | Final published version | en_US |
| dc.type.uri | http://purl.org/eprint/type/ConferencePaper | en_US |
| eprint.status | http://purl.org/eprint/status/NonPeerReviewed | en_US |
| dspace.orderedauthors | Vanhoutte, Michiel; Wang, Bing; Zhou, Zhiping; Michel, Jurgen; Kimerling, Lionel C. | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0002-3913-6189 | |
| mit.license | PUBLISHER_POLICY | en_US |
| mit.metadata.status | Complete | |
