Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
Author(s)Chang, Jae-Byum; Son, Jeong Gon; Hannon, Adam F.; Alexander-Katz, Alfredo; Ross, Caroline A.; Berggren, Karl K.; ... Show more Show less
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Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D self-consistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.
DepartmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science; Massachusetts Institute of Technology. Department of Materials Science and Engineering
American Chemical Society
Chang, Jae-Byum, Jeong Gon Son, Adam F. Hannon, Alfredo Alexander-Katz, Caroline A. Ross, and Karl K. Berggren. Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays. ACS Nano 6, no. 3 (March 27, 2012): 2071-2077.
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