dc.contributor.author | Chang, Jae-Byum | |
dc.contributor.author | Son, Jeong Gon | |
dc.contributor.author | Hannon, Adam F. | |
dc.contributor.author | Alexander-Katz, Alfredo | |
dc.contributor.author | Ross, Caroline A. | |
dc.contributor.author | Berggren, Karl K. | |
dc.date.accessioned | 2013-10-03T20:36:34Z | |
dc.date.available | 2013-10-03T20:36:34Z | |
dc.date.issued | 2012-03 | |
dc.date.submitted | 2011-10 | |
dc.identifier.issn | 1936-0851 | |
dc.identifier.issn | 1936-086X | |
dc.identifier.uri | http://hdl.handle.net/1721.1/81296 | |
dc.description.abstract | Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D self-consistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly. | en_US |
dc.description.sponsorship | United States. Office of Naval Research | en_US |
dc.description.sponsorship | National Science Foundation (U.S.) | en_US |
dc.description.sponsorship | Semiconductor Research Corporation | en_US |
dc.description.sponsorship | University of California, Los Angeles. Center on Functional Engineered Nano Architectonics | en_US |
dc.description.sponsorship | Samsung Electronics Co. (Scholarship foundation) | en_US |
dc.language.iso | en_US | |
dc.publisher | American Chemical Society | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1021/nn203767s | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | MIT web domain | en_US |
dc.title | Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Chang, Jae-Byum, Jeong Gon Son, Adam F. Hannon, Alfredo Alexander-Katz, Caroline A. Ross, and Karl K. Berggren. Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays. ACS Nano 6, no. 3 (March 27, 2012): 2071-2077. | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
dc.contributor.mitauthor | Chang, Jae-Byum | en_US |
dc.contributor.mitauthor | Son, Jeong Gon | en_US |
dc.contributor.mitauthor | Hannon, Adam F. | en_US |
dc.contributor.mitauthor | Alexander-Katz, Alfredo | en_US |
dc.contributor.mitauthor | Ross, Caroline A. | en_US |
dc.contributor.mitauthor | Berggren, Karl K. | en_US |
dc.relation.journal | ACS Nano | en_US |
dc.eprint.version | Author's final manuscript | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dspace.orderedauthors | Chang, Jae-Byum; Son, Jeong Gon; Hannon, Adam F.; Alexander-Katz, Alfredo; Ross, Caroline A.; Berggren, Karl K. | en_US |
dc.identifier.orcid | https://orcid.org/0000-0003-2262-1249 | |
dc.identifier.orcid | https://orcid.org/0000-0003-3473-446X | |
dc.identifier.orcid | https://orcid.org/0000-0001-7453-9031 | |
dc.identifier.orcid | https://orcid.org/0000-0001-5554-1283 | |
dc.identifier.orcid | https://orcid.org/0000-0003-2055-4900 | |
dspace.mitauthor.error | true | |
mit.license | PUBLISHER_POLICY | en_US |
mit.metadata.status | Complete | |