| dc.contributor.author | Mendoza, Hiroshi A. | |
| dc.contributor.author | Ashall, Daniel T. | |
| dc.contributor.author | Yin, Allen S. | |
| dc.contributor.author | Baldo, Marc A. | |
| dc.contributor.author | Bahlke, Matthias Erhard | |
| dc.date.accessioned | 2013-12-09T14:17:24Z | |
| dc.date.available | 2013-12-09T14:17:24Z | |
| dc.date.issued | 2012-09 | |
| dc.date.submitted | 2012-08 | |
| dc.identifier.issn | 09359648 | |
| dc.identifier.issn | 1521-4095 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/82881 | |
| dc.description.abstract | To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the remaining CO[subscript 2] is sublimed to lift off unwanted material. Pixel densities of 325 pixels-per-inch are shown. | en_US |
| dc.description.sponsorship | United States. Dept. of Energy. Office of Basic Energy Sciences (Award DE-SC0001088) | en_US |
| dc.description.sponsorship | MIT Energy Initiative (Graduate Fellowship in Energy) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | Wiley Blackwell | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1002/adma.201202446 | en_US |
| dc.rights.uri | http://creativecommons.org/licenses/by/2.5/ | en_US |
| dc.source | PMC | en_US |
| dc.title | Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Bahlke, Matthias E., Hiroshi A. Mendoza, Daniel T. Ashall, Allen S. Yin, and Marc A. Baldo. “Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists.” Advanced Materials 24, no. 46 (December 4, 2012): 6136-6140. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
| dc.contributor.mitauthor | Bahlke, Matthias Erhard | en_US |
| dc.contributor.mitauthor | Mendoza, Hiroshi A. | en_US |
| dc.contributor.mitauthor | Yin, Allen S. | en_US |
| dc.contributor.mitauthor | Baldo, Marc A. | en_US |
| dc.relation.journal | Advanced Materials | en_US |
| dc.eprint.version | Final published version | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dspace.orderedauthors | Bahlke, Matthias E.; Mendoza, Hiroshi A.; Ashall, Daniel T.; Yin, Allen S.; Baldo, Marc A. | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0003-2201-5257 | |
| mit.license | PUBLISHER_CC | en_US |
| mit.metadata.status | Complete | |
