MIT Libraries logoDSpace@MIT

MIT
View Item 
  • DSpace@MIT Home
  • MIT Open Access Articles
  • MIT Open Access Articles
  • View Item
  • DSpace@MIT Home
  • MIT Open Access Articles
  • MIT Open Access Articles
  • View Item
JavaScript is disabled for your browser. Some features of this site may not work without it.

All graphene electromechanical switch fabricated by chemical vapor deposition

Author(s)
Milaninia, Kaveh M.; Baldo, Marc A.; Reina, Alfonso; Kong, Jing
Thumbnail
DownloadBaldo_All graphene.pdf (532.4Kb)
PUBLISHER_POLICY

Publisher Policy

Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.

Terms of use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Metadata
Show full item record
Abstract
We demonstrate an electromechanical switch comprising two polycrystalline graphene films; each deposited using ambient pressure chemical vapor deposition. The top film is pulled into electrical contact with the bottom film by application of approximately 5 V between the layers. Contact is broken by mechanical restoring forces after bias is removed. The device switches several times before tearing. Demonstration of switching at low voltage confirms that graphene is an attractive material for electromechanical switches. Reliability may be improved by scaling the device area to within one crystalline domain of the graphene films.
Date issued
2009-11
URI
http://hdl.handle.net/1721.1/85955
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science; Massachusetts Institute of Technology. Department of Materials Science and Engineering
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Milaninia, Kaveh M., Marc A. Baldo, Alfonso Reina, and Jing Kong. “All Graphene Electromechanical Switch Fabricated by Chemical Vapor Deposition.” Appl. Phys. Lett. 95, no. 18 (2009): 183105. © 2009 American Institute of Physics
Version: Final published version
ISSN
00036951

Collections
  • MIT Open Access Articles

Browse

All of DSpaceCommunities & CollectionsBy Issue DateAuthorsTitlesSubjectsThis CollectionBy Issue DateAuthorsTitlesSubjects

My Account

Login

Statistics

OA StatisticsStatistics by CountryStatistics by Department
MIT Libraries
PrivacyPermissionsAccessibilityContact us
MIT
Content created by the MIT Libraries, CC BY-NC unless otherwise noted. Notify us about copyright concerns.