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dc.contributor.authorFeng, Y.
dc.contributor.authorLee, K.
dc.contributor.authorFarhat, Hootan
dc.contributor.authorKong, Jing
dc.date.accessioned2014-05-19T13:13:29Z
dc.date.available2014-05-19T13:13:29Z
dc.date.issued2009-11
dc.date.submitted2009-08
dc.identifier.issn00218979
dc.identifier.issn1089-7550
dc.identifier.urihttp://hdl.handle.net/1721.1/87047
dc.description.abstractThis work examines the enhancement of current on/off ratio in field effect transistordevices with bundled single-walled carbon nanotubes(CNTs) by incorporating a substrate etching step before the electrical cutting for metallic CNT elimination. The etching step prevents the damaging of the semiconducting CNTs while burning off the metallic ones by electrical current. By further incorporating a repeated gate voltage sweeping step, devices with low I[subscript off] (less than 2 nA) and high I[subscript on]/I[subscript off], which is one to five orders of magnitude larger than before etching/cutting combination process, can be obtained.en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3253737en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleCurrent on/off ratio enhancement of field effect transistors with bundled carbon nanotubesen_US
dc.typeArticleen_US
dc.identifier.citationFeng, Y., K. Lee, H. Farhat, and J. Kong. “Current On/off Ratio Enhancement of Field Effect Transistors with Bundled Carbon Nanotubes.” Journal of Applied Physics 106, no. 10 (2009): 104505. © 2009 American Institute of Physicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.mitauthorLee, K.en_US
dc.contributor.mitauthorFarhat, Hootanen_US
dc.contributor.mitauthorKong, Jingen_US
dc.relation.journalJournal of Applied Physicsen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsFeng, Y.; Lee, K.; Farhat, H.; Kong, J.en_US
dc.identifier.orcidhttps://orcid.org/0000-0003-0551-1208
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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