dc.contributor.author | Feng, Y. | |
dc.contributor.author | Lee, K. | |
dc.contributor.author | Farhat, Hootan | |
dc.contributor.author | Kong, Jing | |
dc.date.accessioned | 2014-05-19T13:13:29Z | |
dc.date.available | 2014-05-19T13:13:29Z | |
dc.date.issued | 2009-11 | |
dc.date.submitted | 2009-08 | |
dc.identifier.issn | 00218979 | |
dc.identifier.issn | 1089-7550 | |
dc.identifier.uri | http://hdl.handle.net/1721.1/87047 | |
dc.description.abstract | This work examines the enhancement of current on/off ratio in field effect transistordevices with bundled single-walled carbon nanotubes(CNTs) by incorporating a substrate etching step before the electrical cutting for metallic CNT elimination. The etching step prevents the damaging of the semiconducting CNTs while burning off the metallic ones by electrical current. By further incorporating a repeated gate voltage sweeping step, devices with low I[subscript off] (less than 2 nA) and high I[subscript on]/I[subscript off], which is one to five orders of magnitude larger than before etching/cutting combination process, can be obtained. | en_US |
dc.language.iso | en_US | |
dc.publisher | American Institute of Physics (AIP) | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1063/1.3253737 | en_US |
dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
dc.source | MIT web domain | en_US |
dc.title | Current on/off ratio enhancement of field effect transistors with bundled carbon nanotubes | en_US |
dc.type | Article | en_US |
dc.identifier.citation | Feng, Y., K. Lee, H. Farhat, and J. Kong. “Current On/off Ratio Enhancement of Field Effect Transistors with Bundled Carbon Nanotubes.” Journal of Applied Physics 106, no. 10 (2009): 104505. © 2009 American Institute of Physics | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
dc.contributor.mitauthor | Lee, K. | en_US |
dc.contributor.mitauthor | Farhat, Hootan | en_US |
dc.contributor.mitauthor | Kong, Jing | en_US |
dc.relation.journal | Journal of Applied Physics | en_US |
dc.eprint.version | Final published version | en_US |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
dspace.orderedauthors | Feng, Y.; Lee, K.; Farhat, H.; Kong, J. | en_US |
dc.identifier.orcid | https://orcid.org/0000-0003-0551-1208 | |
mit.license | PUBLISHER_POLICY | en_US |
mit.metadata.status | Complete | |