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dc.contributor.authorTirado, J. M.
dc.contributor.authorNezich, Daniel A.
dc.contributor.authorZhao, X.
dc.contributor.authorChung, J. W.
dc.contributor.authorKong, Jing
dc.contributor.authorPalacios, Tomas
dc.date.accessioned2014-05-23T15:08:53Z
dc.date.available2014-05-23T15:08:53Z
dc.date.issued2010-11
dc.date.submitted2010-07
dc.identifier.issn10711023
dc.identifier.urihttp://hdl.handle.net/1721.1/87120
dc.description.abstractWe investigate the carrier mobility in monolayer and bilayer graphene with a top HfO2dielectric, as a function of the HfO2film thickness and temperature. The results show that the carrier mobility decreases during the deposition of the first 2–4 nm of top dielectric and remains constant for thicker layers. The carrier mobility shows a relatively weak dependence on temperature indicating that phonon scattering does not play a dominant role in controlling the carrier mobility. The data strongly suggest that fixed charged impurities located in close proximity to the graphene are responsible for the mobility degradation.en_US
dc.description.sponsorshipEuropean Social Funden_US
dc.description.sponsorshipConsejeria de Educacion y Ciencia de la Junta de Comunidades de Castilla-La Manchaen_US
dc.description.sponsorshipMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics/American Vacuum Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1116/1.3516649en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleStudy of transport properties in graphene monolayer flakes on SiO[sub 2] substratesen_US
dc.typeArticleen_US
dc.identifier.citationTirado, J. M., D. Nezich, X. Zhao, J. W. Chung, J. Kong, and T. Palacios. “Study of Transport Properties in Graphene Monolayer Flakes on SiO[sub 2] Substrates.” J. Vac. Sci. Technol. B 28, no. 6 (2010): C6D11.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.contributor.mitauthorNezich, Daniel A.en_US
dc.contributor.mitauthorZhao, X.en_US
dc.contributor.mitauthorChung, J. W.en_US
dc.contributor.mitauthorKong, Jingen_US
dc.contributor.mitauthorPalacios, Tomasen_US
dc.relation.journalJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structuresen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsTirado, J. M.; Nezich, D.; Zhao, X.; Chung, J. W.; Kong, J.; Palacios, T.en_US
dc.identifier.orcidhttps://orcid.org/0000-0003-0551-1208
dc.identifier.orcidhttps://orcid.org/0000-0002-2190-563X
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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