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dc.contributor.authorZhang, Wangyang
dc.contributor.authorBalakrishnan, Karthik
dc.contributor.authorLi, Xin
dc.contributor.authorBoning, Duane S.
dc.contributor.authorSaxena, Sharad
dc.contributor.authorStrojwas, Andrzej
dc.contributor.authorRutenbar, Rob A.
dc.date.accessioned2014-12-22T15:41:06Z
dc.date.available2014-12-22T15:41:06Z
dc.date.issued2013-06
dc.date.submitted2013-01
dc.identifier.issn0278-0070
dc.identifier.issn1937-4151
dc.identifier.urihttp://hdl.handle.net/1721.1/92431
dc.description.abstractIn this paper, we propose a new technique to achieve accurate decomposition of process variation by efficiently performing spatial pattern analysis. We demonstrate that the spatially correlated systematic variation can be accurately represented by the linear combination of a small number of templates. Based on this observation, an efficient sparse regression algorithm is developed to accurately extract the most adequate templates to represent spatially correlated variation. In addition, a robust sparse regression algorithm is proposed to automatically remove measurement outliers. We further develop a fast numerical algorithm that may reduce the computational time by several orders of magnitude over the traditional direct implementation. Our experimental results based on both synthetic and silicon data demonstrate that the proposed sparse regression technique can capture spatially correlated variation patterns with high accuracy and efficiency.en_US
dc.description.sponsorshipFocus Center Research Program. Focus Center for Circuit & System Solutionsen_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant CCF-0915912)en_US
dc.description.sponsorshipInterconnect Focus Center (United States. Defense Advanced Research Projects Agency and Semiconductor Research Corporation)en_US
dc.language.isoen_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1109/TCAD.2013.2245942en_US
dc.rightsCreative Commons Attribution-Noncommercial-Share Alikeen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/4.0/en_US
dc.sourceBoningen_US
dc.titleEfficient Spatial Pattern Analysis for Variation Decomposition Via Robust Sparse Regressionen_US
dc.typeArticleen_US
dc.identifier.citationWangyang Zhang, K. Balakrishnan, Xin Li, D. S. Boning, S. Saxena, A. Strojwas, and R. A. Rutenbar. “Efficient Spatial Pattern Analysis for Variation Decomposition Via Robust Sparse Regression.” IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 32, no. 7 (July 2013): 1072–1085.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microsystems Technology Laboratoriesen_US
dc.contributor.approverBoning, Duane S.en_US
dc.contributor.mitauthorBalakrishnan, Karthiken_US
dc.contributor.mitauthorBoning, Duane S.en_US
dc.relation.journalIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systemsen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsWangyang Zhang; Balakrishnan, K.; Xin Li, K.; Boning, D. S.; Saxena, S.; Strojwas, A.; Rutenbar, R. A.en_US
dc.identifier.orcidhttps://orcid.org/0000-0002-0417-445X
mit.licenseOPEN_ACCESS_POLICYen_US
mit.metadata.statusComplete


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