| dc.contributor.author | Hannon, Adam F. | |
| dc.contributor.author | Gotrik, Kevin W. | |
| dc.contributor.author | Alexander-Katz, Alfredo | |
| dc.contributor.author | Ross, Caroline A. | |
| dc.contributor.author | Berggren, Karl K. | |
| dc.contributor.author | Tavakkoli Kermani Ghariehali, Amir | |
| dc.date.accessioned | 2015-01-06T19:09:32Z | |
| dc.date.available | 2015-01-06T19:09:32Z | |
| dc.date.issued | 2012-06 | |
| dc.date.submitted | 2012-04 | |
| dc.identifier.issn | 09359648 | |
| dc.identifier.issn | 1521-4095 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/92712 | |
| dc.description.abstract | Using an array of majority-block-functionalized posts makes it possible to locally control the self-assembly of a block copolymer and achieve several morphologies on a single substrate. A template consisting of a square symmetry array of posts produces a square-symmetry lattice of microdomains, which doubles the areal density of features. | en_US |
| dc.description.sponsorship | Semiconductor Research Corporation | en_US |
| dc.description.sponsorship | FENA Center | en_US |
| dc.description.sponsorship | Semiconductor Research Corporation. Nanoscale Research Initiative | en_US |
| dc.description.sponsorship | Singapore-MIT Alliance | en_US |
| dc.description.sponsorship | National Science Foundation (U.S.) | en_US |
| dc.description.sponsorship | Taiwan Semiconductor Manufacturing Company | en_US |
| dc.description.sponsorship | Tokyo Electron Limited | en_US |
| dc.description.sponsorship | National University of Singapore | en_US |
| dc.language.iso | en_US | |
| dc.publisher | Wiley Blackwell | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1002/adma.201104895 | en_US |
| dc.rights | Creative Commons Attribution-Noncommercial-Share Alike | en_US |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-sa/4.0/ | en_US |
| dc.source | Tavakkoli | en_US |
| dc.title | Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Tavakkoli K. G., Amir, Adam F. Hannon, Kevin W. Gotrik, Alfredo Alexander-Katz, Caroline A. Ross, and Karl K. Berggren. “Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer.” Advanced Materials 24, no. 31 (June 21, 2012): 4249–4254. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Research Laboratory of Electronics | en_US |
| dc.contributor.approver | Tavakkoli Kermani Ghariehali, Amir | en_US |
| dc.contributor.mitauthor | Alexander-Katz, Alfredo | en_US |
| dc.contributor.mitauthor | Tavakkoli Kermani Ghariehali, Amir | en_US |
| dc.contributor.mitauthor | Hannon, Adam F. | en_US |
| dc.contributor.mitauthor | Gotrik, Kevin W. | en_US |
| dc.contributor.mitauthor | Ross, Caroline A. | en_US |
| dc.contributor.mitauthor | Berggren, Karl K. | en_US |
| dc.relation.journal | Advanced Materials | en_US |
| dc.eprint.version | Author's final manuscript | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dspace.orderedauthors | Tavakkoli K. G., Amir; Hannon, Adam F.; Gotrik, Kevin W.; Alexander-Katz, Alfredo; Ross, Caroline A.; Berggren, Karl K. | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0003-2262-1249 | |
| dc.identifier.orcid | https://orcid.org/0000-0002-9498-7808 | |
| dc.identifier.orcid | https://orcid.org/0000-0001-7453-9031 | |
| dc.identifier.orcid | https://orcid.org/0000-0001-5554-1283 | |
| mit.license | OPEN_ACCESS_POLICY | en_US |
| mit.metadata.status | Complete | |