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dc.contributor.authorZhang, Lihua
dc.contributor.authorSu, Dong
dc.contributor.authorDuan, Huigao
dc.contributor.authorStach, Eric A.
dc.contributor.authorBerggren, Karl K.
dc.contributor.authorManfrinato, Vitor Riseti
dc.contributor.authorHobbs, Richard
dc.date.accessioned2015-01-13T18:46:24Z
dc.date.available2015-01-13T18:46:24Z
dc.date.issued2013-03
dc.date.submitted2013-02
dc.identifier.issn1530-6984
dc.identifier.issn1530-6992
dc.identifier.urihttp://hdl.handle.net/1721.1/92829
dc.description.abstractWe investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist. We also analyzed the resolution limits of this technique by measuring the point-spread function at 200 keV. Furthermore, we measured the energy loss in the resist using electron-energy-loss spectroscopy.en_US
dc.description.sponsorshipUnited States. Dept. of Energy. Office of Basic Energy Sciences (Award DE-SC0001088)en_US
dc.language.isoen_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/nl304715pen_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceManfrinatoen_US
dc.titleResolution Limits of Electron-Beam Lithography toward the Atomic Scaleen_US
dc.typeArticleen_US
dc.identifier.citationManfrinato, Vitor R., Lihua Zhang, Dong Su, Huigao Duan, Richard G. Hobbs, Eric A. Stach, and Karl K. Berggren. “Resolution Limits of Electron-Beam Lithography Toward the Atomic Scale.” Nano Lett. (March 19, 2013): 130321102652000.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.approverManfrinato, Vitor Risetien_US
dc.contributor.mitauthorBerggren, Karl K.en_US
dc.contributor.mitauthorManfrinato, Vitor Risetien_US
dc.contributor.mitauthorHobbs, Richarden_US
dc.relation.journalNano Lettersen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsManfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K.en_US
dc.identifier.orcidhttps://orcid.org/0000-0003-0855-3710
dc.identifier.orcidhttps://orcid.org/0000-0002-9129-4731
dc.identifier.orcidhttps://orcid.org/0000-0001-7453-9031
mit.licensePUBLISHER_POLICYen_US


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