| dc.contributor.author | Zhang, Lihua | |
| dc.contributor.author | Su, Dong | |
| dc.contributor.author | Duan, Huigao | |
| dc.contributor.author | Stach, Eric A. | |
| dc.contributor.author | Berggren, Karl K. | |
| dc.contributor.author | Manfrinato, Vitor Riseti | |
| dc.contributor.author | Hobbs, Richard | |
| dc.date.accessioned | 2015-01-13T18:46:24Z | |
| dc.date.available | 2015-01-13T18:46:24Z | |
| dc.date.issued | 2013-03 | |
| dc.date.submitted | 2013-02 | |
| dc.identifier.issn | 1530-6984 | |
| dc.identifier.issn | 1530-6992 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/92829 | |
| dc.description.abstract | We investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist. We also analyzed the resolution limits of this technique by measuring the point-spread function at 200 keV. Furthermore, we measured the energy loss in the resist using electron-energy-loss spectroscopy. | en_US |
| dc.description.sponsorship | United States. Dept. of Energy. Office of Basic Energy Sciences (Award DE-SC0001088) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | American Chemical Society (ACS) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1021/nl304715p | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | Manfrinato | en_US |
| dc.title | Resolution Limits of Electron-Beam Lithography toward the Atomic Scale | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Manfrinato, Vitor R., Lihua Zhang, Dong Su, Huigao Duan, Richard G. Hobbs, Eric A. Stach, and Karl K. Berggren. “Resolution Limits of Electron-Beam Lithography Toward the Atomic Scale.” Nano Lett. (March 19, 2013): 130321102652000. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Research Laboratory of Electronics | en_US |
| dc.contributor.approver | Manfrinato, Vitor Riseti | en_US |
| dc.contributor.mitauthor | Berggren, Karl K. | en_US |
| dc.contributor.mitauthor | Manfrinato, Vitor Riseti | en_US |
| dc.contributor.mitauthor | Hobbs, Richard | en_US |
| dc.relation.journal | Nano Letters | en_US |
| dc.eprint.version | Author's final manuscript | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dspace.orderedauthors | Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0003-0855-3710 | |
| dc.identifier.orcid | https://orcid.org/0000-0002-9129-4731 | |
| dc.identifier.orcid | https://orcid.org/0000-0001-7453-9031 | |
| mit.license | PUBLISHER_POLICY | en_US |
| mit.metadata.status | Complete | |
