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dc.contributor.authorPowell, D. M.
dc.contributor.authorHao, R.
dc.contributor.authorRavi, T. S.
dc.contributor.authorHofstetter, Jasmin
dc.contributor.authorFenning, David P.
dc.contributor.authorBuonassisi, Tonio
dc.date.accessioned2015-06-08T18:58:01Z
dc.date.available2015-06-08T18:58:01Z
dc.date.issued2013-12
dc.date.submitted2013-09
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/1721.1/97226
dc.description.abstractWe evaluate defect concentrations and investigate the lifetime potential of p-type single-crystal kerfless silicon produced via epitaxy for photovoltaics. In gettered material, low interstitial iron concentrations (as low as (3.2 ± 2.2) × 10[superscript 9] cm[superscript −3]) suggest that minority-carrier lifetime is not limited by dissolved iron. An increase in gettered lifetime from <20 to >300 μs is observed after increasing growth cleanliness. This improvement coincides with reductions in the concentration of Mo, V, Nb, and Cr impurities, but negligible change in the low area-fraction (<5%) of dislocated regions. Device simulations indicate that the high bulk lifetime of this material could support solar cell efficiencies >23%.en_US
dc.description.sponsorshipUnited States. Dept. of Energy (Contract DE-EE0005314)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (United States. Dept. of Energy NSF CA EEC-1041895)en_US
dc.description.sponsorshipAmerican Society for Engineering Education. National Defense Science and Engineering Graduate Fellowshipen_US
dc.description.sponsorshipAlexander von Humboldt-Stiftung (Feodor Lynen Postdoctoral Fellowship)en_US
dc.language.isoen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.4844915en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOther repositoryen_US
dc.titleEffective lifetimes exceeding 300 μs in gettered p-type epitaxial kerfless silicon for photovoltaicsen_US
dc.typeArticleen_US
dc.identifier.citationPowell, D. M., J. Hofstetter, D. P. Fenning, R. Hao, T. S. Ravi, and T. Buonassisi. “Effective Lifetimes Exceeding 300 Μs in Gettered p-Type Epitaxial Kerfless Silicon for Photovoltaics.” Appl. Phys. Lett. 103, no. 26 (December 23, 2013): 263902. © 2013 AIP Publishing LLCen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Research Laboratory of Electronicsen_US
dc.contributor.mitauthorPowell, D. M.en_US
dc.contributor.mitauthorHofstetter, Jasminen_US
dc.contributor.mitauthorFenning, David P.en_US
dc.contributor.mitauthorBuonassisi, Tonioen_US
dc.relation.journalApplied Physics Lettersen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsPowell, D. M.; Hofstetter, J.; Fenning, D. P.; Hao, R.; Ravi, T. S.; Buonassisi, T.en_US
dc.identifier.orcidhttps://orcid.org/0000-0002-4609-9312
dc.identifier.orcidhttps://orcid.org/0000-0001-8345-4937
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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