| dc.contributor.author | Do, Hyung Wan | |
| dc.contributor.author | Chang, Jae-Byum | |
| dc.contributor.author | Berggren, Karl K | |
| dc.date.accessioned | 2015-11-09T14:24:48Z | |
| dc.date.available | 2015-11-09T14:24:48Z | |
| dc.date.issued | 2014-08 | |
| dc.date.submitted | 2014-06 | |
| dc.identifier.issn | 2166-2746 | |
| dc.identifier.issn | 2166-2754 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/99750 | |
| dc.description.abstract | In this work, the authors developed two processes for fabricating three-dimensional (3D) nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. The resist stack was patterned in a single electron-beam writing step without removing the wafer. The resulting 3D nanostructures naturally achieved vertical self-alignment without the need for any intermediate alignment. Self-aligned mushroom-shaped posts and freestanding supported structures were demonstrated. | en_US |
| dc.description.sponsorship | Taiwan Semiconductor Manufacturing Company | en_US |
| dc.description.sponsorship | National Science Foundation (U.S.) (Award DMR-1234169) | en_US |
| dc.language.iso | en_US | |
| dc.publisher | American Vacuum Society (AVS) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1116/1.4893659 | en_US |
| dc.rights | Creative Commons Attribution-Noncommercial-Share Alike | en_US |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-sa/4.0/ | en_US |
| dc.source | MIT web domain | en_US |
| dc.title | Three-dimensional nanofabrication using HSQ/PMMA bilayer resists | en_US |
| dc.title.alternative | Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Do, Hyung Wan, Jae-Byum Chang, and Karl K. Berggren. “Three-Dimensional Nanofabrication Using Hydrogen Silsesquioxane/poly(methylmethacrylate) Bilayer Resists.” Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 32, no. 6 (November 2014): 06F501. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
| dc.contributor.department | Program in Media Arts and Sciences (Massachusetts Institute of Technology) | en_US |
| dc.contributor.mitauthor | Do, Hyung Wan | en_US |
| dc.contributor.mitauthor | Chang, Jae-Byum | en_US |
| dc.contributor.mitauthor | Berggren, Karl K. | en_US |
| dc.relation.journal | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena | en_US |
| dc.eprint.version | Author's final manuscript | en_US |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | en_US |
| eprint.status | http://purl.org/eprint/status/PeerReviewed | en_US |
| dspace.orderedauthors | Do, Hyung Wan; Chang, Jae-Byum; Berggren, Karl K. | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0003-3219-5474 | |
| dc.identifier.orcid | https://orcid.org/0000-0001-7453-9031 | |
| dc.identifier.orcid | https://orcid.org/0000-0003-2055-4900 | |
| mit.license | OPEN_ACCESS_POLICY | en_US |
| mit.metadata.status | Complete | |
