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dc.contributor.authorLaine, Hannu S.
dc.contributor.authorVahlman, Henri
dc.contributor.authorHaarahiltunen, Antti
dc.contributor.authorJensen, Mallory A.
dc.contributor.authorModanese, Chiara
dc.contributor.authorWagner, Matthias
dc.contributor.authorWolny, Franziska
dc.contributor.authorBuonassisi, Tonio
dc.contributor.authorSavin, Hele
dc.date.accessioned2021-10-28T17:46:33Z
dc.date.available2021-10-28T17:46:33Z
dc.date.issued2018
dc.identifier.urihttps://hdl.handle.net/1721.1/136720
dc.language.isoen
dc.publisherAuthor(s)en_US
dc.relation.isversionof10.1063/1.5049255en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceOther repositoryen_US
dc.titleVertically integrated modeling of light-induced defects: Process modeling, degradation kinetics and device impacten_US
dc.typeArticleen_US
dc.identifier.citationLaine, Hannu S., Vahlman, Henri, Haarahiltunen, Antti, Jensen, Mallory A., Modanese, Chiara et al. 2018. "Vertically integrated modeling of light-induced defects: Process modeling, degradation kinetics and device impact." 1999.
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dc.date.updated2020-06-24T18:30:47Z
dspace.date.submission2020-06-24T18:30:50Z
mit.journal.volume1999en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work and Publication Information Neededen_US


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