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On-Wafer Integration of Nitrides and Si Devices: Bringing the Power of Polarization to Si

Author(s)
Chung, Jinwook; Lu, Bin; Palacios, Tomas
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Abstract
The seamless integration of AlGaN/GaN transistors and Si CMOS electronics on the same chip will revolutionize digital and mixed signal electronics. In this talk we describe our group's effort on demonstrating this integration. Si-GaN-Si virtual substrates have been recently fabricated through substrate removal and wafer bonding processes. The very high thermal stability of nitrides allows for the fabrication of Si CMOS electronics on these substrates without degrading the performance of the embedded nitride layer. In addition, GaN transistors on Si (001) have been fabricated on these substrates for the first time. Some of the many new circuits and devices that this integration allows include high power analog-to-digital converters, high speed differential amplifiers, normally-off power transistors, and highly-compact power regulator circuits.
Date issued
2009-07
URI
http://hdl.handle.net/1721.1/58959
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Journal
Proceedings of the IEEE MTT-S International Microwave Symposium Digest, 2009
Publisher
Institute of Electrical and Electronics Engineers
Citation
Chung, J.W., Bin Lu, and T. Palacios. “On-wafer integration of nitrides and Si devices: Bringing the power of polarization to Si.” Microwave Symposium Digest, 2009. MTT '09. IEEE MTT-S International. 2009. 1117-1120. © Copyright 2010 IEEE
Version: Final published version
Other identifiers
INSPEC Accession Number: 10788700
ISBN
978-1-4244-2803-8
ISSN
0149-645X
Keywords
Silicon, Nitride Semiconductors, MOSFET, Integration, High Electron Mobility Transistor, HEMT

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